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    STUDIA PHYSICA - Issue no. 2 / 2006  
         
  Article:   THE INFLUENCE OF DEPOSITION PARAMETERS ON STRUCTURAL AND ELECTRICAL RESISTANCE OF EPITAXIAL BI:2212 THIN FILMS.

Authors:  S. MANOLACHE, A.V. POP.
 
       
         
  Abstract:  The deposition parameters (sputtering pressure, substrate temperature, d.c.plasma power and sputtering gas composition) for the deposition of thin Bi:2212 films by d.c.magnetron sputtering have been modified. X-ray diffraction and electrical resistance function of temperature, shows the influence of temperature substrate on the intergrowth defects.  
         
     
         
         
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