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STUDIA PHYSICA - Issue no. 2 / 2006 | |||||||
Article: |
THE INFLUENCE OF DEPOSITION PARAMETERS ON STRUCTURAL AND ELECTRICAL RESISTANCE OF EPITAXIAL BI:2212 THIN FILMS. Authors: S. MANOLACHE, A.V. POP. |
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Abstract: The deposition parameters (sputtering pressure, substrate temperature, d.c.plasma power and sputtering gas composition) for the deposition of thin Bi:2212 films by d.c.magnetron sputtering have been modified. X-ray diffraction and electrical resistance function of temperature, shows the influence of temperature substrate on the intergrowth defects. | |||||||