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This paper presents the possibility of achieving high selectivity and efficiency at low FeCl₃ and CuCl₂ concentrations by adding small quantities of thiourea, thiosulfate and thiocyanate into the solution. The overall metal dissolution in the presence of 0.1 M thiosulfate, thiocyanate and thiourea is significantly higher (60 % compared to 32 %), than in chloride medium, for both oxidants. However, the increase of ligand concentration decreases the global metal dissolution degree, but improves the selectivity of the leaching processes. The results show that different oxidant and ligand combination promote the dissolution of one metal or another, making possible the use of these leaching systems for selective metal dissolution.

Keywords: FeCl₃ and CuCl₂, leaching systems, thiosulfate, thiocyanate, thiourea