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    STUDIA PHYSICA - Issue no. 2 / 2013  
         
  Article:   THE INFLUENCE OF PROCESSING PARAMETERS ON STRUCTURE OF Al-ZnO THIN FILMS.

Authors:  D. MARCONI, A.V. POP.
 
       
         
  Abstract:  ZnO and 1.5%Al-doped ZnO (Al:ZnO) thin films were deposited on glass substrate using RF magnetron sputtering technique. The influence of substrate-target distance and the partial pressure of oxygen in sputtering gas on the structure of thin films is analyzed by X-Ray diffraction (XRD). From (XRD), it is found that all films are highly oriented with their crystallographic c-axis perpendicular to the substrate and that the grain size is influenced by both target-substrate distance and oxygen concentration in flow sputtering gas.

Keywords: Al-ZnO thin films, RF magnetron sputtering, XRD.
 
         
     
         
         
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