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    STUDIA PHYSICA - Issue no. 1 / 2010  
         
  Article:   STRUCTURAL AND ELECTRIC PROPERTIES OF Bi:2212 THIN FILMS OBTAINED BY THE OPTIMIZATION OF D. C. SPUTTERING PARAMETERS AND SUBSTRATE TEMPERATURE.

Authors:  A.V. POP, I. POP, S. MANOLACHE.
 
       
         
  Abstract:  

The target and growth conditions (sputtering pressure, substrate temperature, d. c. plasma power and sputtering gas composition) for the deposition of thin Bi:2212 films by d. c. magnetron sputtering have been optimized.

X-ray diffraction shows that the films are single phase, oriented with their c-axis perpendicular to the substrate surface. Transport properties investigated by electrical resistivity function of temperature show the influence of substrate temperature on the intergrowth defects.

 

Keywords: Bi:2212 thin film, DC magnetron sputtering, growth conditions, XRD, resistivity.

 

 
         
     
         
         
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