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Authors: A.V. POP, I. POP, S. MANOLACHE.
The target and growth conditions (sputtering pressure, substrate temperature, d. c. plasma power and sputtering gas composition) for the deposition of thin Bi:2212 films by d. c. magnetron sputtering have been optimized.
X-ray diffraction shows that the films are single phase, oriented with their c-axis perpendicular to the substrate surface. Transport properties investigated by electrical resistivity function of temperature show the influence of substrate temperature on the intergrowth defects.
Keywords: Bi:2212 thin film, DC magnetron sputtering, growth conditions, XRD, resistivity.
