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    STUDIA PHYSICA - Issue no. 1 / 2002  
         
  Article:   ROTATIONAL TEMPERATURES OF THE OH BAND IN A VERY LOW RF POWER CAPACITIVELY COUPLED PLASMA.

Authors:  ALPAR SIMON, SORIN DAN ANGHEL, S. SIMON, T. FRENŢIU, ERNA CZIRJAK, EMIL CORDOŞ.
 
       
         
  Abstract:  The very low power radiofrequency capacitively coupled plasma could be used as spectral source for the analysis of pneumatically nebulised liquid samples or non-conductive solid samples via atomic emission spectroscopy technique. The plasma could be easily sustained at atmospheric pressure in Ar, air or their mixtures. In the present paper, this new spectral source was characterized from physical point of view, by means of rotational temperatures of the OH band. The rotational temperatures (1900 2900 K) were measured as function of radiofrequency power, observation height, radial position, gas flow-rate and gas composition. The experimental spectra was compared to the computer simulated syntethic spectra. The temperatures determined from the OH (0, 0) spectra are in good agreement with temperatures obtained for other plasma spectral sources.  
         
     
         
         
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