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    STUDIA CHEMIA - Ediţia nr.3 din 2011  
         
  Articol:   EFECTUL DIN TEMPERATURA SUBSTRATULUI DIFERIT ASUPRA CREŞTERII NANO DIAMANTULUI CRISTALIN CU TECHNINCA HFCVD.

Autori:  HASTI ATEFI, MAHMOOD GHORANNEVISS, ZAHRA KHALAJ, MIRCEA V. DIUDEA. 		 
       
         
  Rezumat:  In this paper, we investigated the effects of different substrate temperature and nitrogen etching gas on synthesis of Nano Crystalline Diamonds (NCDs). We prepared all samples by Hot Filament Chemical Vapor Deposition (HFCVD) system. Silicon wafers (100) were used as substrates for all experiments. All samples were coated by Au at 50 nm thickness, as catalyst layers, by sputtering system. To remove the native oxide on silicon, all the samples were cleaned in ultrasonic bath by acetone, ethanol and de-ionized water, respectively. Substrate temperature was controlled by thermocouple in contact with substrate holder, between 550°C and 650°C. The samples were examined by X-Ray diffraction spectroscopy at room temperature. The changes of surface morphology of the diamond Nano crystals were clearly viewed by the Scanning Electron Microscopy SEM. The results show nanocrystalline diamond films and diamond nano crystals grown on substrate under various temperatures with different crystalline structures.

Keywords: Etching, Hot filament CVD, Nanocrystalline diamond films, SEM. 		 
         
     
         
         
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